PFA SonicLine
November 2009
Flow Measurement & Control
Flow measurement with ultrasound – fast, precise and free from contamination.
The new PFA SonicLine ultrasonic flowmeters from GEMU assure precise measurement and control of chemical consumption and management of chemical stocks with high reliability. SonicLine is also ideally suited for accurate batch and dosing processes with high reproducibility.
SonicLine ultrasound technology functions using the phase differential method. This technology offers the capability to measure the flow volume accurately, yet externally, without touching the medium. There are no moving parts or instruments in contact with the media itself, minimising pressure loss and eliminating particle contamination of the flow medium. The device offers a low maintenance alternative, except for the periodic visual inspection. This design can be used for both high purity and non-conductive media. These are just some of the potential advantages over conventional measuring instruments such as differential pressure metering orifices, vortex flowmeters with baffles, turbines and toothed wheel flowmeters and magnetic-inductive flowmeters (MID).
The fast detection speed of 250 values/second is also advantageous in dosing tasks. Fast changes and fluctuations in the flow speed are registered and processed immediately. In systems with quick-closing/regulating valves and short controlled lines, very precise and short dosing processes can be implemented. The device is also equipped with a sum function for batching processes. Another advantage with regard to rapidly repeating processes is the high reproducibility of the measured values of 0,5% as well as the high accuracy of 1% of the measured value.
SonicLine is also suitable for process monitoring and control in very dynamic flow situations with fixed flow volumes that need to be regulated quickly. Exact information of the media quantities used, is just as important as leak monitoring and the monitoring of two set limit values.
The devices are suitable for use in most chemical applications including highly aggressive hydrofluoric acid. Applications include high purity chemicals and solvents in the semiconductor and solar industry, analytical and medical equipment as well as the biotechnology and pharmaceutical industries. The device meets high purity standards as well as the associated leach-out tests of the semiconductor industry.
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